ION Implant
Essential in the semiconductor industry, Ion Implant technology is the basic building block process used in the formation of transistors. This process allows the semiconductor wafer manufacturer to change the electrical properties in pre-selected regions of the silicon wafer.
CU Deposition
Wolfe Engineering is helping the semiconductor industry perpetuate Moore’s Law by supporting the transition to copper from traditional aluminum interconnects. As the industry aggressively pioneers the use of copper deposition in advanced generation semiconductor devices, Wolfe Engineering is providing specialized liquid management systems for the safe delivery of the constituents required in this electroplating process.
